Objective lens arrangement usable in particle-optical systems

ABSTRACT

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to an objective lens arrangement for usein particle-optical systems. In addition, the invention relates to aparticle-optical beam system as well as a particle-optical inspectionsystem.

The invention may be applied to charged particles of any type, such aselectrons, positrons, muons, ions (charged atoms or molecules) andothers.

Brief Description of Related Art

The increasing demand for ever smaller and more complex microstructureddevices and the continuing demand for an increase of a throughput in themanufacturing and inspection processes thereof have been an incentivefor the development of particle-optical systems that use multiplecharged particle beamlets in place of a single charged particle beam,thus significantly improving the throughput of such systems. Themultiple charged particle beamlets may be provided by a single columnusing a multi-aperture array, for instance, or by multiple individualcolumns, or a combination of both, as will be described in more detailbelow. The use of multiple beamlets is associated with a whole range ofnew challenges to the design of particle-optical components,arrangements and systems, such as microscopes and lithography systems.

A conventional particle-optical system is known from U.S. Pat. No.6,252,412 B1. The electron microscopy apparatus disclosed therein isused for inspecting an object, such as a semiconductor wafer. Aplurality of primary electron beams is focused in parallel to each otheron the object to form a plurality of primary electron spots thereon.Secondary electrons generated by the primary electrons and emanatingfrom respective primary electron spots are detected. For each primaryelectron beam a separate electron beam column is provided. The pluralityof separate electron beam columns is closely packed. A density of theprimary electron beam spots formed on the object is limited by aremaining footstep size of the electron beam columns forming theelectron microscopy apparatus. Thus, the number of primary electron beamspots, which may be formed simultaneously on the object, is also limitedin practice, resulting in a limited throughput of the apparatus wheninspecting semiconductor wafers of a high surface area at a highresolution.

From U.S. Pat. No. 5,892,224, US 2002/0148961 A1, US 2002/0142496 A1, US2002/0130262 A1, US 2002/0109090 A1, US 2002/0033449 A1, US 2002/0028399A1, electron microscopy apparatus are known which use a plurality ofprimary electron beamlets focused onto the surface of the object to beinspected. The beamlets are generated by a multi-aperture plate having aplurality of apertures formed therein, wherein an electron sourcegenerating a single electron beam is provided upstream of themulti-aperture plate for illuminating the apertures formed therein.Downstream of the multiple-aperture plate a plurality of electronbeamlets is formed by those electrons of the electron beam that pass theapertures. The plurality of primary electron beamlets is focused on theobject by an objective lens having an aperture, which is passed by allprimary electron beamlets. An array of primary electron spots is thenformed on the object. Secondary electrons emanating from each primaryelectron spot form a respective secondary electron beamlet, such that aplurality of secondary electron beamlets corresponding to the pluralityof primary electron beam spots is generated. The plurality of secondaryelectron beamlets also pass the objective lens, and the apparatusprovides a secondary electron beam path such that each of the secondaryelectron beamlets is supplied to a respective one of a plurality ofdetector pixels of a CCD electron detector. A Wien-filter is used forseparating the secondary electron beam path from a beam path of theprimary electron beamlets.

Since one common primary electron beam path comprising the plurality ofprimary electron beamlets and one common secondary electron beam pathcomprising the plurality of secondary electron beamlets is used, onesingle electron-optical column may be employed, and the density ofprimary electron beam spots formed on the object is not limited by afoot step size of the single electron-optical column.

The number of primary electron beam spots disclosed in the embodimentsof the above-mentioned documents is in the order of some ten spots.Since the number of primary electron beam spots formed on the object atthe same time limits the throughput, it is desirable to increase thenumber of primary electron beam spots in order to achieve a higherthroughput. It has been found, however, that it is difficult to increasethe number of primary electron beam spots formed at the same time, or toincrease a primary electron beam spot density, employing the technologydisclosed in those documents while maintaining a desired imagingresolution of the electron microscopy apparatus.

What has been described above with reference to electrons applies in asimilar manner to other charged particles.

It is therefore an object of the present invention to provide anobjective lens arrangement as well as a particle-optical system havingimproved particle-optical properties.

SUMMARY OF THE INVENTION

The present invention is applicable to particle-optical systems usingmultiple beamlets of charged particles; the present invention is,however, not limited in the application to systems using multiplebeamlets, but is equally applicable to particle-optical systems usingonly one single beam of charged particles.

According to a first aspect, the present invention provides an objectivelens arrangement having an object plane and an axis of symmetry andcomprising first, second and third pole pieces which are substantiallyrotationally symmetric with respect to an axis of symmetry and which aredisposed on a same side of the object plane. The first, second and thirdpole pieces extend towards the axis of symmetry such that radial innerends of the first, second and third pole pieces each define a bore whichis to be traversed by a beam path of one or more beams of chargedparticles. A radial inner end of the first pole piece is disposed at adistance from a radial inner end of the second pole piece to form afirst gap between them, and a radial inner end of the third pole pieceis disposed at a distance from the radial inner end of the second polepiece to form a second gap between them.

The axis of symmetry referred to above generally coincides with theoptical axis of a particle-optical system the objective lens arrangementis comprised in, such that the two terms are used to the same effectherein. The objective lens arrangement may also be described as having acentral axis which may or may not also be an axis of symmetry, whichcentral axis generally coincides with the optical axis of a system theobjective lens arrangement is comprised in and thus also be usedsynonymously to the term optical axis.

A first excitation coil is provided for generating a magnetic field in aregion of the first gap, and a second excitation coil is provided forgenerating a magnetic field in a region of the second gap. A first powersupply is provided for supplying an excitation current to the firstexcitation coil, and a second power supply is provided for supplying anexcitation current to the second excitation coil. The first and secondpower supplies may be two portions of a same power supply. The first andsecond power supplies are configured to supply currents to the first andsecond excitation coils and thus generate excitation currents such thata magnetic flux generated by the first excitation coil in the secondpole piece is oriented in the same or a different direction as amagnetic flux generated by the second excitation coil in the second polepiece.

Generally, the first excitation coil is disposed between the first andsecond pole pieces and the second excitation coil disposed between thesecond and third pole pieces.

Depending on a shape, configuration and position of the pole pieces, aposition and configuration of the excitation coil and an excitationcurrent, the magnetic field generated in a region of the gap may havedifferent magnetic field strengths and different dimensions. Forinstance, the magnetic field may extend only over a region close to thegap or may extend as far as the object plane. Since magnetic lenses areusually employed in inspection optical systems to provide a focusingeffect, a magnetic focusing field generally extends as far as the objectplane in order to achieve a good focusing effect, avoid defocusingbefore the object plane and avoid particle-optical aberrations.

The objective lens arrangement according to the first aspect of thepresent invention allows adjusting the magnetic fields in the first andsecond gaps such that the magnetic field in the first gap provides afocusing effect on the one or more beams of charged particles traversingthe focusing magnetic field whilst the magnetic field generated in thesecond gap is configured to compensate for the focusing magnetic fieldextending from the first gap to locations on or at least close to theobject plane.

The first and second gaps may be disposed at an angle to one another,for instance. The angle formed between the first and second radial gapsmay be in a range of from 10 to about 170 degrees, for instance, and maybe in a range of from 45 to 135 degrees or from 60 to 120 degrees, byway of example. In other words, in this exemplary embodiment, the firstgap is disposed at an angle to the axis of symmetry that is differentfrom an angle formed between the second gap and the axis of symmetry.For purposes of determining an angle between gaps, a straight lineconnecting the radial inner ends of the respective pole pieces formingthe gap may be employed to represent the gap.

In an exemplary embodiment, the first gap is oriented substantially inan axial direction, i.e. substantially parallel or at a relatively smallangle to the axis of symmetry, and thus forms an axial gap. An axial gapdoes not necessarily imply that radial innermost ends of the pole piecesforming the gap need to have the same distance from the axis ofsymmetry, but also encompasses those embodiments wherein the innermostends have different distances from the axis of symmetry and wherein thegap formed between points on radial inner ends of the pole pieces thatare disposed closest to one another form an angle of less than 45°, forinstance less than 30° or less than 15° to the axis of symmetry. Thesecond gap may be oriented substantially in a radial direction withrespect to the objective lens arrangement, i.e. orthogonal to the axisof symmetry and thus form a radial gap. Radial gaps also encompass thoseembodiments wherein the gap defined by a closest distance (straight linealong the closest distance) between the inner radial ends of the polepieces is disposed at an angle of from about 50° to 90° to the axis ofsymmetry, such as from about 80° to 90° to the axis of symmetry.

According to an exemplary embodiment, the focusing magnetic field(generated in the first gap) is compensated for by the magnetic fieldgenerated in the second gap to such an extent that a total magneticfield in a region on the object plane and about the optical axis issubstantially zero, in other words, the compensating magnetic fieldsubstantially cancels the focusing magnetic field in a region on theobject plane.

Such a configuration allows obtaining advantageous imaging propertieswith the objective lens arrangement. In particular, an image rotationcaused by the focusing magnetic field may be eliminated in the vicinityof the object plane. This allows achieving improved overall performanceof the system, in particular with regard to structured objects, whichare inspected and/or processed using the objective lens arrangement.

The configuration of, in particular, the embodiment with the first gapbeing an axial gap and the second gap being a radial gap is particularlyadvantageous, since the pole pieces can be arranged such that the radialinner end of the second pole piece is disposed close to the object planesuch that the focusing magnetic field is also generated and disposedclose to the object plane. On the other hand, having a radial gap formedbetween the inner radial end of the second pole piece, which alsodefines the lower end of the first gap, and the third pole piece allowsthe radial gap to be disposed close to the first gap and the focusingmagnetic field to be generated close to the object plane, thus providingthe magnetic field compensating effect in very close vicinity to theobject plane. The radial orientation of the second gap also allowsgenerating the compensating magnetic field downstream of the objectivelens arrangement thus not interfering with the focusing magnetic fieldinside the objective lens arrangement and thus not impairing a focusingeffect provided thereby. This embodiment thus advantageously allows themajor portion of the focusing magnetic field to remain unaffected andenables the compensating field to take effect on/close to the objectplane.

Therefore, in exemplary embodiments, the radial inner end of the thirdpole piece and the radial inner end of the second pole piece aredisposed in substantially a same plane, which plane is disposedsubstantially parallel to the object plane.

In a further exemplary embodiment, the objective lens arrangement mayadditionally comprise a fourth pole piece which is substantiallyrotationally symmetric with respect to the axis of symmetry, wherein athird gap is formed between the fourth pole piece and the first polepiece, and wherein the third gap is disposed at a greater distance fromthe object plane than the first gap; and a third excitation coil forgenerating an adjusting magnetic field in the third gap.

The adjusting magnetic field may be used to adjust the focusing magneticfield in terms of its strength, location, dimension and otherparameters. The adjusting magnetic field may be used to increase ordecrease the focusing magnetic field strength, for instance. The fourthgap may be an axial gap, for example. The inner radial end of the fourthpole piece may be disposed at a distance from the axis of symmetry thatis greater, equal to or smaller than a distance between the radial innerend of the first pole piece and the axis of symmetry, for instance.

The pole pieces may be disposed and configured such that, for instance,the second and third pole pieces are electrically connected to eachother and the first pole piece is electrically insulated from the secondand third pole pieces, such as by an insulating layer.

In those exemplary embodiments, the insulating layer may be providedbetween an outer cylindrical portion of or integrally formed with thefirst pole piece and a substantially cylindrical yoke formed by andconnecting the second and third pole pieces. The outer cylindricalportion may extend around and substantially parallel to the yoke as wellas the axis of symmetry, for example, such that the insulating layeralso extends substantially in an axial direction. In addition oralternatively, the first pole piece may comprise an annular,substantially disc-shaped or disc-like portion or have an annulardisc-shaped or disc-like portion integrally formed with it. In thoseexemplary embodiments, the insulating layer may be provided between theouter annular disc shaped portion integrally formed with the first polepiece, and an outer portion of the second pole piece. In those exemplaryembodiments, the annular disc-shape or disc-like portion and the outerportion are arranged to have parallel surfaces over at least a portionthereof.

In further exemplary embodiments, the first pole piece comprises aninner member and an outer member, that is comprises two distinct parts,with the inner and outer members being electrically insulated from oneanother by an insulating layer. Inner and outer, as used herein, referto a radial distance from the axis of symmetry, i.e. a distance from theaxis of symmetry in a plane orthogonal to the axis of symmetry. In thoseexemplary embodiments, an additional insulating layer may be providedbetween the outer member of the first pole piece and an outer portion ofthe second pole piece. The outer member of the first pole piece in thisexemplary embodiment of the objective lens arrangement according to thepresent invention may be configured to accommodate the first excitationcoil. The inner member of the first pole piece may comprise or consistof a substantially conical portion extending towards the axis ofsymmetry. The outer member may have or comprise a substantially annularshape, for instance.

According to a second aspect, the invention provides an objective lensarrangement having an object plane and an axis of symmetry andcomprising first and second pole pieces which are rotationally symmetricwith respect to the axis of symmetry, with inner ends of the first andsecond pole pieces defining respective bores which are configured to betraversed by a beam path of one or more beams of charged particles. Theradial inner end of the first pole piece is disposed at a distance fromthe radial inner end of the second pole piece to form a (first) gapbetween them, with the second pole piece being disposed closer to theobject plane than the first pole piece. The first and second pole piecesare electrically insulated from each other. A first excitation coil isprovided for generating a focusing magnetic field in the first gap, anda beam tube extends through the bore formed by the radial inner end ofthe first pole piece.

The objective lens arrangement according to the second aspect furthercomprises an object mount for mounting an object to be processed suchthat the object is disposed in the object plane. The object mountincludes an electrical connector for supplying an electrical voltage tothe object to be processed.

As used herein, “object to be processed” is to be understood asencompassing objects that are inspected, imaged and/or manipulated by acharged particle beam or a plurality of charged particle beamlets.

The objective lens arrangement according to the second aspect of thepresent invention further comprises a first voltage source configuredfor supplying a voltage to the beam tube such that the beam tube is morethan about 15 kV above ground potential. A second voltage source isprovided and configured for supplying a voltage to the electricalconnector such that the electrical connector is grounded or below groundpotential. In exemplary embodiments, the second voltage source may beconfigured to supply a voltage such that the electrical connector ismore than about 15 kV below ground potential.

In exemplary embodiments, the objective lens arrangement according tothe second aspect of the present invention further comprises a thirdvoltage source configured for supplying a voltage to the second polepiece such that a potential of the second pole piece is from about 0.1kV to about 10 kV above a potential of the electrical connector. Thefirst through third voltage sources may be individual voltage sources orportions of a same voltage source.

Such an arrangement allows to obtain advantageous optical properties ofan electron microscopy system, for instance, using the objective lensarrangement since a primary electron beam having a particularly highkinetic energy may be generated and formed by beam shaping components ofthe electron microscopy system, and the primary electrons of the beamare decelerated to desired kinetic energies only shortly above theobject plane, thus greatly reducing Coulomb interactions between theprimary electrons. Further, an electrical field generated between theobject disposed in the object plane and the second pole piece willaccelerate secondary electrons emanating from the object.

In exemplary embodiments, voltages supplied by the first or secondvoltage sources include voltages which may be equal to or higher than 20kV, 25 kV, 30 kV and may be equal to or higher than 45 kV, for instance.

The voltage supplied by the third voltage source may be an adjustablevoltage, for instance, which allows precise adjustment of an electricalfield immediately above the object plane to a desired value. Likewise,in exemplary embodiments, the first and/or second voltage sources may beadjustable voltage sources.

In an exemplary embodiment, the beam tube is electrically insulated fromthe first pole piece.

In further exemplary embodiments, the first pole piece is substantiallyat ground potential.

According to a further exemplary embodiment, the third voltage sourcehas one of its connectors connected to the second pole piece and anotherof its connectors connected to the electrical connector of the objectmount, i.e. is connected to both the second pole piece and theelectrical connector.

In a further exemplary embodiment, the first pole piece is electricallyinsulated from the second and third pole pieces by a thin insulatinglayer. In advantageous embodiments thereof, a large area of overlap isprovided between the first pole piece on one side and the second orthird pole pieces on the other side, in other words a large area isprovided in which opposite surfaces of the respective pole pieces arearranged in the vicinity of one another and preferably parallel ornearly parallel to one another. This allows for a sufficient electricalinsulation between the first pole piece and the second and third polepieces whilst maintaining a sufficiently low magnetic resistance forgenerating the focusing magnetic field in the first gap.

Generally, in those exemplary embodiments, the insulating layer ispreferably provided between an outer portion of the first pole piece andan outer portion of the second pole piece.

In those exemplary embodiments wherein the first pole piece has anintegrally formed outer cylindrical portion, the insulating layer ispreferably provided between the cylindrical portion of the first polepiece and an outer portion of the second pole piece.

In further exemplary embodiments of the objective lens arrangementaccording to the second aspect, the objective lens arrangement mayfurther comprise a third pole piece having a radial inner end which isdisposed at a distance from the radial inner end of the second polepiece to form a second gap, wherein the first pole piece is electricallyinsulated from both the second and third pole pieces by an insulatinglayer.

Embodiments and features of the objective lens arrangement according tothe first aspect are equally applicable to the objective lensarrangement according to the second aspect.

In further exemplary embodiments, the first pole piece comprises aninner member and an outer member, that is two separate parts, with theinner and outer members being electrically insulated from each other byan insulating layer. The outer member would then also comprise the outerportion of the pole piece that is generally disposed to face the outerportion of the second pole piece. In exemplary embodiments, the outermember of the first pole piece is configured to accommodate the firstexcitation coil and the inner member of the first pole piece comprises asubstantially conical portion extending towards the axis of symmetry.These embodiments are particularly advantageous when the inner member ofthe first pole piece is disposed adjacent to the beam tube andelectrically connected thereto.

Dividing the first pole piece into an inner member and an outer memberand electrically connecting the inner member and the beam tube extendingthrough the bore formed by the inner member has the advantage thatprovision of electrical power to the beam tube is facilitated. Ratherthan having to provide electrical wiring to the beam tube itself, theelectrical power is provided via the inner member of the pole piece,which is more easily accessible for electrical connections. In addition,dividing the first pole piece into two members and electricallyinsulating the two members from one another saves the provision of anelectrically insulating layer between the beam tube and the first polepiece, which tends to require a complex layout to avoid creep currentsand the like.

In a third aspect, the invention provides an objective lens arrangement,comprising a second pole piece and a third pole piece, wherein thesecond and third pole pieces are substantially rotationally symmetricwith respect to an axis of symmetry, wherein the second and third polepieces are disposed on a same side of an object plane of the objectivelens arrangement, wherein a radial inner end of the third pole piece isdisposed at a distance from a radial inner end of the second pole pieceto form a second gap, and wherein the second and third pole pieces areelectrically connected to each other; a second excitation coil forgenerating a magnetic field in the second gap; and a second power supplyconfigured for supplying an excitation current to the second excitationcoil, wherein the second power supply is substantially at groundpotential; and a third voltage source configured for supplying a voltageto the second pole piece such that the second pole piece is at apotential differing from a potential of the second excitation coil bymore than about 15 kV, in particular more than 20 kV, in particular morethan 25 kV, and in particular more than 30 kV.

The pole pieces of the objective lens arrangement according to thisaspect of the invention are denoted “second” and “third” pole pieces(rather than “first” and “second”) simply for sake of clarity and easierreference to other embodiments and aspects of the present invention asdescribed herein, the same applies to the numbering of the powersupplies.

In this configuration, the second pole piece may be advantageously usedfor shaping the electrical field in a region close to the object planewhilst, at the same time, avoiding to operate the power supply forsupplying the excitation current to the second excitation coil at a highelectrical potential.

In exemplary embodiments, the objective lens arrangement according tothe third aspect of the present invention further comprises: a firstpole piece, wherein the first pole piece is substantially rotationallysymmetric with respect to the axis of symmetry, wherein the first polepiece is disposed on the same side of the object plane of the objectivelens arrangement as the second and third pole pieces, wherein a radialinner end of the first pole piece is disposed at a distance from theradial inner end of the second pole piece to form a first gap, andwherein the first pole piece is electrically insulated from the secondand third pole pieces, wherein the third voltage source is furtherconfigured to supply the voltage to the second pole piece such that thesecond pole piece is at a potential differing from a potential of thefirst pole piece by more than about 15 kV, in particular more than 20kV, in particular more than 25 kV, and in particular more than 30 kV;and a first excitation coil for generating a magnetic field in the firstgap.

According to a further exemplary embodiment, a cooling system isprovided which includes a cooling medium supply for supplying a coolingmedium to the second excitation coil. Advantageously, the cooling mediumsupply may be set to ground potential or near ground potential. Thecooling medium may be water, for instance.

According to a fourth aspect of the present invention, an objective lensarrangement is provided comprising a second pole piece and a third polepiece, wherein the second and third pole pieces are substantiallyrotationally symmetric with respect to an axis of symmetry, wherein thesecond and third pole pieces are disposed on a same side of an objectplane of the objective lens arrangement, wherein a radial inner end ofthe third pole piece is disposed at a distance from a radial inner endof the second pole piece to form a second gap, wherein the second andthird pole pieces are electrically connected with each other.

The objective lens arrangement according to the fourth aspect furthercomprises a second excitation coil for generating a magnetic field inthe second gap; and a third voltage source configured for supplying avoltage to the second pole piece such that the second pole piece is at apotential differing from a potential of the compensating coil by morethan about 15 kV, in particular more than 20 kV, in particular more than25 kV, in particular more than 30 kV, and in particular more than 45 kV.

The second excitation coil of the objective lens according to thisaspect of the present invention comprises a plurality of windings of aninsulated wire, and at least one further insulating layer is providedfor supporting the second excitation coil with respect to at least oneof the second and third pole pieces.

Such further insulating layer, which is different from an insulatinglayer surrounding a wire forming the individual windings, allows toefficiently insulate the whole body of the second excitation coil fromthe second and third pole pieces and thus allows a power supply forsupplying the second excitation coil with a suitable current to bemaintained at a potential different from the potential of the second andthird pole pieces.

The insulating layer may be made from ceramic material or cast resin,for instance.

The pole pieces of the objective lens arrangement according to thisaspect of the invention are, in analogy to the third aspect, denoted“second” and “third” pole pieces (rather than “first” and “second”)simply for sake of clarity and easier reference to other embodiments andaspects of the present invention as described herein. This applieslikewise to the voltage source(s).

In an exemplary embodiment, the objective lens arrangement according tothe fourth aspect further comprises a first pole piece, wherein thefirst pole piece is substantially rotationally symmetric with respect tothe axis of symmetry, wherein the first pole piece is disposed on thesame side of the object plane of the objective lens arrangement as thesecond and third pole pieces, wherein a radial inner end of the firstpole piece is disposed at a distance from the radial inner end of thesecond pole piece to form a first gap, and wherein the first pole pieceis electrically insulated from the second and third pole pieces, whereinthe third voltage source is further configured to supply the voltage tothe second pole piece such that the second pole piece is at a potentialdiffering from a potential of the first pole piece by more than about 15kV, in particular more than 20 kV, in particular more than 25 kV, and inparticular more than 30 kV; and a first excitation coil for generating amagnetic field in the first gap.

In a fifth aspect, the present invention provides an objective lensarrangement comprising an object mount for mounting an object to beprocessed such that the object is disposed in an object plane of theobjective lens arrangement, wherein the object mount includes anelectrical connector for delivering an electrical voltage to the object.The objective lens arrangement further comprises a pole piece, which isreferred to as the third pole piece in line with the terminology of theother aspects of the present invention, which third pole piece issubstantially rotationally symmetric with respect to an axis of symmetryof the objective lens arrangement and which extends substantiallytransversely to the axis of symmetry. A voltage source, referred to inthe following as the third voltage source, is provided and configuredfor supplying a voltage to the third pole piece such that the third polepiece is at a potential differing from a potential of the electricalconnector by from about 0.1 kV to about 10 kV. The objective lensarrangement further comprises a shielding electrode which is disposedbetween the third pole piece and the object plane, and which iselectrically insulated from the third pole piece.

The voltage applied to the third pole piece serves to generate anelectrical field on a surface of the object in a region where it isbeing processed, whereas the provision of the shielding electrode allowsto shield regions of the object outside of the region being processedfrom said electrical field. This shielding effect thus allows avoidingor reducing charging effects on the object.

According to an exemplary embodiment, the shielding electrode iselectrically connected to the electrical connector of the object mountsuch that substantially no electrical field is present in the spacebetween the object plane and the shielding electrode.

According to a further exemplary embodiment, the shielding electrodesubstantially has a ring-shape with an inner aperture, which issubstantially concentric with the optical axis of the system or the axisof symmetry of the objective lens arrangement, respectively.

The third pole piece has a surface facing in a direction of the objectmount. In exemplary embodiments, the third pole piece has a radial innerannular portion in which said surface extends substantially parallel tothe object plane at a first distance from the object plane, and a radialouter annular portion in which the surface extends substantiallyparallel to the object plane at a second distance from the object plane,wherein the second distance is greater than the first distance. Theradial inner annular portion has a radial inner end which may coincidewith the inner peripheral edge of the third pole piece, and a radialouter end which may coincide with the surface of the third pole piecewhich is disposed at a different angle to the object plane than theinner angular portion. Hence, the inner annular portion is disposedcloser to the object plane than the outer annular portion. Furthermore,in this exemplary embodiment, the shielding electrode has an inneraperture, which may be concentric about the axis of symmetry of thethird pole piece, as described above, wherein the inner annular portionof the third pole piece is disposed and configured such that its radialouter end is disposed within the inner aperture of the shieldingelectrode. In other words, in this exemplary embodiment, a diameter ofthe inner aperture is greater than a diameter of the inner annularportion of the third pole piece such that the inner annular portion maybe contained entirely within the inner aperture of the shieldingelectrode, and the inner annular portion may be disposed in a same planeas the shielding electrode. Thus, the shielding electrode would also bedisposed at about the first distance from the object plane. In thoseexemplary embodiments, the second distance of the outer annular portionof the third pole piece would need to be chosen such that it permits theshielding electrode to be arranged in the same plane and a gap to bekept in between the third pole piece, in particular in a region of theannular outer portion, and the shielding electrode

In those exemplary embodiments, the inner annular portion and the outerannular portion may be disposed immediately adjacent one another, suchthat the surface of the third pole piece (facing the object plane) wouldhave a step to accommodate the transition from the first to the seconddistance, or the inner and outer annular portions may be joined to oneanother by a middle annular portion disposed at an angle to the objectplane to accommodate the transition from the first to the seconddistance. The middle annular portion could be relatively small comparedto the other annular portions, for instance, such that most of thesurface of the third pole piece opposite the object would be disposedsubstantially parallel to the object plane, such that in thoseembodiments, the third pole piece would comprise a small bend in themiddle annular portion.

Substantially parallel, as used in this context, shall also comprisethose embodiments wherein the surface of the radial outer annularportion is disposed at an angle of up to 30°, for instance, or up to 20°in a further example, with respect to the object plane and/or whereinthe radial inner annular portion is disposed at an angle of up to 20°with respect to the object plane, or up to 10° in another example.

The objective lens arrangement according to this aspect of the presentinvention may also comprise additional components and features asdescribed herein in connection with the other aspects of the presentinvention. In particular, in exemplary embodiments, the objective lensarrangement further comprises a second pole piece, wherein a radialinner end of the third pole piece and a radial inner end of the secondpole piece form a gap between them. In further exemplary embodiments,the second pole piece has an inner angular portion with a surface facingthe third pole piece and the third pole piece has an angular portionwith a surface facing the second pole piece, wherein the surfaces of thethird and second pole pieces facing each other form an angle of lessthan 40°, for instance less than 35° between them. The gap may be asubstantially radial gap. In yet further exemplary embodiments, thesecond pole piece has a inner annular portion wherein the surface facingthe third pole piece is disposed at an angle of from between about 3° toabout 35° with respect to the surface of the inner annular portion ofthe third pole piece facing the second pole piece.

According to a sixth aspect of the present invention, an objective lensarrangement is provided which comprises an object mount for mounting anobject to be processed in an object plane, and first and second polepieces which are substantially rotationally symmetric with respect to anaxis of symmetry of the objective lens arrangement. The first and secondpole pieces extend towards the axis of symmetry such that radial innerends of the first and second pole pieces define bores which areconfigured to be traversed by one or more beams of charged particles. Afirst excitation coil is provided for generating a focusing magneticfield in a first gap formed between the radial inner end of the firstpole piece and the radial inner end of the second pole piece. A beamtube configured for guiding the one ore more beams of charged particlesextends through the bore formed by the radial inner end of the firstpole piece. In embodiments according to this aspect, the bore of thefirst pole piece generally extends from a first plane where a diameterof the bore is a minimum diameter to a second plane in which a frontsurface portion of the first pole piece is disposed. The diameter of thebore increases from its minimum diameter in the first plane to a frontdiameter in the second plane by more than about 10 mm, wherein adistance between the first and second planes is more than about 5 mm,thus resulting in a tapering shape.

Such a tapering or conical shape of the first pole piece allows shapinga distribution of a magnetic field strength on the axis of symmetry,which generally coincides with an optical axis of a particle-opticalsystem, such that desired optical properties of the objective lens maybe achieved.

According to a seventh aspect of the present invention, a chargedparticle beam system is provided which comprises a charged particlesource for generating a beam of charged particles, at least one beamshaping lens configured to be traversed by the charged particles and anobjective lens configured to be traversed by the charged particles,wherein the objective lens has an axis of symmetry and an object planeassociated therewith.

The at least one beam shaping lens and the objective lens are configuredsuch that an average direction of incidence of charged particles, whichaverage direction of incidence may be defined as an average over alldirections from which charged particles are incident at a respectivelocation of the object plane, is oriented away from the optical axis ina ring-shaped inner portion of the object surrounding the optical axis,and such that the average directions of incidence at locations within aring-shaped outer portion of the portion of the object plane surroundingthe ring-shaped inner portion are oriented towards the optical axis.

Such a configuration allows to reduce a third order telecentricity errorin the object plane by a substantial amount.

According to an exemplary embodiment, a maximum average angle θ_(i) ofthe average angles of incidence at the location within the ring-shapedinner portion relates to a maximum average angle θ_(o) of the averageangles of incidence at the locations within the ring-shaped outerportion as defined by the following equation:

$0.5 < \frac{\theta_{i}}{\theta_{0}} < 2.$

In an exemplary embodiment, the maximum average angle θ_(i) differs fromthe maximum average angle θ_(o) by at most 30% of the absolute value ofthe maximum average angle θ_(o), for instance at most 20%. It may evendiffer by as little as 15% or less or even 10% or less.

According to a further exemplary embodiment, the maximum average angleof the average angles of incidence at the locations within thering-shaped outer portion is more than about 1 mrad.

Such a configuration may be advantageously put into practice using anobjective lens arrangement that includes a pole piece having a taperingshape, as described above. A further advantage of such a configurationis that it allows reducing a field curvature associated with theobjective lens arrangement.

According to an eighth aspect of the present invention, an objectivelens arrangement is provided, which comprises an object mount formounting an object to be processed in an object plane, a first electrodedisposed at a distance from the object plane and having an aperture of afirst diameter which is concentric with an axis of symmetry of theobjective lens arrangement, and a second electrode disposed at a seconddistance from the object plane and in between the first electrode andthe object plane, and having an aperture of a second diameter, whichaperture is concentric to the axis of symmetry.

A first voltage supply is connected to the first electrode and may beconfigured and operated such that the first electrode is set to a firstpotential relative to the object to be processed, and a second voltagesupply is connected to the second electrode and may be configured andoperated such that the second electrode is set to a second potentialrelative to the object to be processed.

The first and second distances, the first and second diameters and thefirst and second voltages are adjusted such that a contribution of thefirst electrode to an electrical field generated immediately above theobject plane is of a same order of magnitude as a contribution of thesecond electrode to said electrical field. The contributions of thefirst or second electrodes to the generated electrical field may beassessed and tested by comparing two settings, a first and a secondsetting.

In the first setting, the first electrode is at the first potentialrelative to the electrical connector and thus the object and the secondelectrode is at the same potential as the electrical connector. In thesecond setting, the first electrode is at the first potential relativeto the electrical connector and the second electrode is at the samepotential as the first electrode.

According to an exemplary embodiment, the following relation isfulfilled:

${\frac{\left( {E_{1} - E_{2}} \right)}{2 \cdot \left( {E_{1} + E_{2}} \right)} < 0.3},$

wherein

-   -   E₁ is the electrical field at the object plane in the first        setting, and    -   E₂ is the electrical field at the object plane in the second        setting.

In exemplary embodiments, the above defined ratio (E₁−E₂)/2(E₁+E₂) maybe equal to or smaller than 0.2, or be equal to or smaller than 0.1, orbe equal to or smaller than 0.05.

This aspect applies in particular to electron beam systems. Aconfiguration wherein this relation is fulfilled is particularlyadvantageous when a large aperture of the electrode adjacent to theobject plane generating the electrical field in the object plane and acorrespondingly large electrical field in the object plane are applied.A homogenous electrical field in the region of the object plane providesa homogeneous extraction field for secondary electrons, which is likelyto result in improved secondary electron yield and/or good aberrationcoefficients for the secondary electrons.

According to a ninth aspect, the present invention provides aparticle-optical inspection system comprising: an objective lensarrangement comprising a first pole piece and a second pole piece,wherein the first and second pole pieces are substantially rotationallysymmetric with respect to an axis of symmetry, wherein a radial innerend of the first pole piece is disposed at a distance from a radialinner end of the second pole piece to form a first gap between them,wherein the first pole piece has an inner portion extending at an angletowards the axis of symmetry and wherein the first and second polepieces are electrically insulated from each other; a first excitationcoil for generating a focusing magnetic field in a region of the firstgap; a beam tube extending through a bore formed by the radial inner endof the first pole piece; and a first voltage source configured forsupplying a voltage to the beam tube; with the particle-opticalinspection system further comprising a beam path splitting arrangementcomprising at least one magnetic field arrangement, wherein a lower endof the at least one magnetic field arrangement of the beam pathsplitting arrangement is disposed at a first distance from the objectplane and wherein an upper end of the first excitation coil is disposedat a second distance from the object plane and wherein the firstdistance is shorter than the second distance. In other words, the beampath splitting arrangement is at least partially inserted into theobjective lens arrangement.

Lower as used above indicates a direction with respect to the objectplane, i.e. lower indicates a closer distance to the object plane thanupper.

Beam splitting arrangements are advantageously used in multi-beaminspection systems, such as described for instance in WO 2005/024881 A2(U.S. provisional application Ser. No. 60/500,256) to the same Assignee,the entire content of which is incorporated by reference herein. A beamsplitting arrangement will be described in detail with reference to thedrawings.

It has been found to be favorable for the beam path splittingarrangement to be disposed close to the object plane. In conventionalsystems employing a beam splitting arrangement, this arrangement istypically disposed upstream of the objective lens arrangement withoutany overlap between these two components. In contrast thereto, accordingto this aspect of the present invention, a lower portion of the beamsplitting arrangement, i.e. the portion of the beam splittingarrangement disposed closest to and facing the object plane, ispractically inserted into the objective lens arrangement. This isparticularly advantageous in inspection systems using electrons ascharged particles since an image of secondary electrons generated byelectrons impinging on the object to be inspected is usually formedclosely above the object plane. Insertion of the beam splittingarrangement into the objective lens arrangement thus allows shortening apath between the image of secondary electrons and a nearest focusingoptical element of the inspection system and thus enables enhancedinspection performance.

In exemplary embodiments of the inspection system according to thisaspect of the present invention, the inner portion of the first polepiece extends towards the axis of symmetry such that the radial innerend of the first pole piece is disposed closer to the object plane thana radial outer end of the inner portion of the first pole piece and thusallows the lower end of the at least one magnetic field arrangement tobe disposed within a bore or space defined by the inner portion of thefirst pole piece.

In this embodiment, the particle-optical inspection system may furthercomprise a mounting structure, that may be attached to the first polepiece, for mounting the magnetic field arrangement of the beam pathsplitting arrangement or, more generally, a lower portion of the beampath splitting arrangement. The mounting structure may also allowadjusting a position of the magnetic field arrangement of the beamsplitting arrangement relative to at least the first pole piece.

For instance, the inner portion of the first pole piece may have asubstantially conical shape with the radial inner end of the first polepiece being disposed closer to the object plane than a radial outer endthereof, and with the lower end of the magnetic field arrangement beingdisposed inside the conus formed by the inner portion of the first polepiece. In those embodiments, the conus formed by the inner portion ofthe first pole piece may having a conus opening angle a in a range offrom 20° to about 70°, for example.

In other exemplary embodiments, the inner portion may comprise twosubstantially cylindrical shapes with a lower of the two cylindersforming a bore having a smaller diameter than an upper cylinder. Inthose embodiments, the lower portion of the beam path splittingarrangement may be disposed at least partially within the bore formed bythe upper cylinder. However, it is not necessary for the bore of thelower cylinder to be smaller, it may also be greater or may be the sameas the bore of the upper cylinder. Other configurations are alsopossible and will be readily apparent to the person skilled in the art.

Even without explicit mentioning, it will be apparent to the skilledperson that individual features or combinations of features ofembodiments of the objective lens arrangements and systems describedherein in connection with a particular aspect of the present inventionmay also be applied in embodiments of the objective lens arrangementsand systems of the other aspects of the invention.

In exemplary embodiments, the objective lens arrangements according tothe present invention may further comprise a heating system disposedwithin at least one excitation coil, the heating system comprising aheating coil disposed in the vicinity of the at least one excitationcoil and a control portion for controlling and adjusting a currentpassing through the heating coil. The at least one excitation coil maybe the first, second and/or third excitation coil of the embodimentsdescribed above. For instance, the heating coil may be disposed withinthe excitation coil, i.e. in a cavity within the excitation coil, or beinterlaced therewith. In particular, the control portion may beconfigured to adjust the current passing through the heating coil independence of at least one of a current passing through the at least oneexcitation coil (excitation current), for instance the at least one ofthe first, second and third excitation coils, a temperature of at leastone of the first, second and third pole pieces, as desired andapplicable. Furthermore, a temperature sensor may be provided in thoseembodiments for sensing the temperatures of at least one of the first,second and third pole pieces. The sensed temperature may then betransmitted to the control portion to control a current provided by thepower supply to the heating coil. This embodiment has the advantage thata temperature of one or more pole pieces may be kept substantiallyconstant. Thus, disturbances caused by heating of the pole pieces, whichmay lead to an expansion of the pole piece material and thus anundesirable change of the dimensions and geometry of the objective lensarrangement, may be avoided. Heating of the pole pieces may result fromprolonged operation of the objective lens system and may also resultfrom a change of application and thus a change of focusing power andassociated change of excitation current. This embodiment allows keepinga magnetic field and thus focusing characteristics of the objective lensarrangements constant and well controllable. In an alternativeembodiment, the heating coil may take a shape of an only nearly closedring about the axis of symmetry, i.e. an incomplete circle wherein endsthereof do not touch. This embodiment is advantageous in that undesiredmagnetic fields that might be generated by the heating coil can beavoided.

Use of a cooling system for cooling in particular the second excitationcoil has already been described above in connection with the thirdaspect of the present invention. Rather than use of a fluid coolingmedium, other embodiments of the objective lens arrangements accordingto any of the aspects of the present invention may make use of a coolingsystem based exclusively on solid-state materials for conducting awayheat generated in particular by the excitation coils.

In an exemplary embodiment, which is explained in the following withreference to the second excitation coil but may also be applied to anyother excitation coil, the second and third pole pieces aresubstantially integrally formed and connected by a yoke, and accommodatethe second excitation coil between them in a region of their outerannular regions. The excitation coil generally comprises a number ofwindings of an insulated wire, which is connected to a power supply. Inthis embodiment, at least an outer side of a body of the excitation coilformed by the wire windings is at least partially encapsulated by oneore more layers of thermally well conducting and electrically insulatingceramic material. This ceramic encapsulation is connected to orintegrally formed with connecting members made of the same or a similarmaterial that extends through portions of the yoke connecting the secondand third pole pieces. Those connecting portions may be distributed atregular intervals around a circumference of the yoke to establish athermally conducting contact to a ring of thermally well conductingsolid material disposed around and adjacent to the radial outer end ofthe yoke. The ring of thermally well conducting material may be madefrom ceramic material, copper or comprise both a ring of ceramicmaterial and a ring of copper that are in contact with one another.Those rings are connected, preferably via copper wire, to a coolingsystem further remote from the second and third pole pieces, which maybe a cooling system based on liquid cooling, for instance. Thesolid-state cooling system has the advantage that insulating the coolingsystem from the high voltage parts comprised in the objective lensarrangements is easier to achieve than in the case of liquid cooling.This embodiment has therefore the advantage that no electricallyconductive material is introduced into the vicinity of the excitationcoil inside the pole piece. It will be apparent to the person skilled inthe art that other suitable thermally well conductive materials may beused and that this kind of cooling system may also be used for the firstand second pole pieces or any other parts of the system that may requirecooling.

In a further exemplary embodiment of the present invention, inparticular in connection with the above-described type of solid-statecooling system, the objective lens arrangement according to the presentinvention may further comprise an adjustable mounting structure formounting the second and third pole pieces. The mounting structure allowsadjusting a position of the second and third pole pieces in particularrelative to the first pole piece. The adjustable mounting structure maycomprise, for instance, a mounting ring disposed around the yokeconnecting the first and second pole pieces and fixedly attachedthereto. In an exemplary embodiment, the mounting ring is held in placeby three or more wires, or flexible elements, more generally. Lower endsof the wires are fixed to the mounting ring, for instance, preferably atpoints spaced equally about a perimeter of the mounting ring, and upperends of the wires are advantageously attached to one or more componentsupstream of the second and third pole pieces, such as the first polepiece. This mounting structure allows holding the second and third polepieces in place without the need for any bulky holding components. Thus,the second and third pole pieces may be held entirely in a vacuumenvironment. A position of the second and third pole pieces, inparticular relative the first pole piece, may be adjusted by suitableshortening or lengthening one or more of the wires, as required.

In further exemplary embodiments, the adjustable mounting structurefurther comprises a fine adjustment arrangement. The fine adjustingarrangement may comprise, for instance, a mechanism for adjusting anaxial position of the mounting ring, or the second and third polepieces, more generally, and a mechanism for adjusting a radial positionof the mounting ring, or the second and third pole pieces, moregenerally, in the objective lens arrangement or a combination of thetwo.

The mechanism for adjusting an axial position of the mounting ring andthus the second and third pole pieces may comprise a screw having oneend attached to a component of the objective lens arrangement which hasa fixed or fixable position, with the screw having a winding which isconnected to the mounting ring such that turning of the screw results ina change of an axial position thereof. For instance, turning the screwmay lift or lower the mounting ring relative to other components of theobjective lens arrangement, such as the first pole piece, for instance.

An adjustment mechanism for adjustment of a radial position may beprovided by an arrangement comprising a combination of a wedge-shapedmember, a bearing comprising a chamber with two balls inside, and ascrew. The chamber and the balls are configured such that the ballstouch each of four side walls of the chamber, the chamber being open toone side such that a pointed side of the wedge can be arranged inbetween and in contact with the two balls. One end of the screw extendsinto the top of the chamber such that turning of the screw drives alower end of the screw further into or out of the chamber and optionallymoves the chamber in an upwards or downwards direction. Turning of thescrew thus effects a change in the distance between the two balls, whichupon approaching one another push the pointed side of the wedgeoutwards. The wedge which is directly or indirectly connected to thepole pieces transfers this movement onto the pole pieces, and thuschanges their radial position in the objective lens arrangement, forinstance relative to the first pole piece. Other adjustment mechanismsknown in the art may also be used.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing as well as other advantageous features of the inventionwill be more apparent from the following detailed description ofexemplary embodiments of the invention with reference to theaccompanying drawings. It is noted that not all possible embodiments ofthe present invention necessarily exhibit each and every, or any, of theadvantages identified herein.

FIG. 1 schematically illustrates basic features and functions of anelectron microscopy system according to an embodiment of the presentinvention;

FIG. 2 is a schematic illustration of an embodiment of an objective lensarrangement, which may be used in the electron microscopy systemdepicted in FIG. 1;

FIG. 3 shows an electrode configuration for illustrating a function offield generating components shown in FIG. 2;

FIG. 4 shows an enlarged view of a lower part of a beam tube of theobjective lens arrangement shown in FIG. 2;

FIG. 5 shows plural physical properties provided by the embodiment ofthe objective lens arrangement shown in FIG. 2 along the optical axis;

FIG. 6 a, FIG. 6b show graphs for illustrating radial dependencies of anaverage angle of incidence in an object plane of the electron microscopysystem shown in FIG. 1;

FIG. 7 schematically shows a further embodiment of an objective lensarrangement according to the present invention;

FIG. 8 shows a further, alternative embodiment of an objective lensarrangement according to the present invention;

FIG. 9 shows an exemplary embodiment of a beam path splittingarrangement;

FIG. 10 shows a cooling structure used in the embodiment depicted inFIG. 8;

FIG. 11 shows an adjusting mechanism used in the mounting structure forholding the second and third pole pieces in the embodiment illustratedin FIG. 8;

FIG. 12 shows a heating system incorporated into the embodiment shown inFIG. 8; and

FIG. 13 shows a detail of the embodiment depicted in FIG. 8.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

In the exemplary embodiments described below, components that are alikein function and structure are designated by alike reference numerals, asfar as possible. Therefore, in order to understand the features of theindividual components of one specific embodiment, the descriptions ofother embodiments and of the summary of the invention may also beconsidered and referred to.

FIG. 1 is a schematic diagram symbolically illustrating basic functionsand components of an electron microscopy system 1. The electronmicroscopy system 1 is of a scanning electron microscope type (SEM)using a plurality of primary electron beamlets 3′ for generating primaryelectron beam spots on a surface of an object to be inspected, whichsurface is arranged in an object plane 101 of an objective lensarrangement 100.

The primary electrons incident on the object at the beam spots generatesecondary electrons emanating from the surface of the object. Thesecondary electrons form secondary electron beamlets entering theobjective lens arrangement 100. The electron microscopy system 1provides a secondary electron beam path 4′ for supplying the pluralityof secondary electron beamlets to a detecting arrangement 200. Detectingarrangement 200 comprises a projecting lens arrangement 201, 202 forprojecting the secondary electron beamlets 4′ onto a surface plane of anelectron sensitive detector 203. The detector 203 can be one or moreselected from a solid state CCD or CMOS, a scintillator arrangement, amicro channel plate, an array of PIN diodes and others.

The primary electron beamlets 3′ are generated by a beamlet generatingarrangement 300 comprising an electron source 301, a beam liner tube302, a collimating lens 303, a multi-aperture plate arrangement 304 anda field lens 305.

In the embodiment depicted in FIG. 1, an electron source 301 is arrangedon an optical axis of the system in a beam liner tube 302 and isadditionally immersed in a magnetic field generated by collimating lens303. The electrons are extracted from the electron source 301 and form adiverging electron beam, which is collimated by collimating lens 303 toform a beam 3 for illuminating multi-aperture arrangement 304.Multi-aperture arrangement 304 comprises a multi-aperture plate 304A,which is mounted in a center of a cup-shaped electrode 304B. Anelectrical field may be generated between the cup-shaped electrode 304Band a flange at the end of beam liner tube 302, which may be adecelerating or retarding field, for instance. The multi-aperturearrangement forms a plurality of primary electron beamlets 3′ from thesingle illuminating beam 3 impinging on the multi-aperture plate 304A.Details of multi-aperture arrangements may be found in the referencescited in the introduction or WO 2005/024881 A2 (U.S. provisionalapplication Ser. No. 60/500,256) to the same Assignee, for instance.

A field lens 305 and objective lens arrangement 100 are provided in thebeam path 3′ of the plurality of primary electron beamlets to project animage of a focus plane of the multi-aperture arrangement 304 onto objectplane 101 to form an array of primary electron beam spots on the object.

A beam path splitting/combining arrangement 400 is also provided in theprimary electron beam path 3′ in between the beamlet generatingarrangement 300 and objective lens arrangement 100 and in the secondaryelectron beam path 4′ in between the objective lens arrangement 100 andthe detecting arrangement 200.

Beam splitting arrangement 400 allows the beam paths of the primaryelectron beamlets 3′ and the secondary electron beamlets 4′ which bothpass through the objective lens arrangement 100 to be separated suchthat the secondary electron beamlets are directed towards the detectingarrangement 200. An exemplary beam splitting arrangement will bedescribed in more detail with reference to FIG. 9.

FIG. 2 shows a schematic cross section of a side view of an exemplaryembodiment of an objective lens arrangement 100 which may be used in theelectron microscopy system shown in FIG. 1. The objective lensarrangement 100 comprises an object mount 121 for mounting an object 7to be inspected such that a surface of the object 7 is disposed withinthe object plane 101 of the electron microscopy system 1. The object 7may be a semiconductor wafer, for instance, which is to be inspected fordefects.

The objective lens 102 comprises a first pole piece 123, which isconcentric about the optical axis 120 (or axis of symmetry) of theobjective lens 102 and has a radial inner end 124. A second magneticpole piece 125 which is also rotationally symmetric and concentric aboutthe optical axis 120 has a radial inner end 126 and is disposed at adistance from radial inner end 124 of the first pole piece 123 such thata substantially axial gap is formed between the radial inner ends 124and 126.

An excitation coil 129 is disposed radially outwardly of (i.e. at agreater distance from) the gap formed between inner ends 124, 126 inbetween the first and second pole pieces 123, 125. A yoke 130 forms partof the first pole piece and extends radially outwardly there from and isdisposed opposite a yoke 131 formed by and extending radially outwardlyfrom second pole piece 125. An electrically insulating resin 133 isprovided in a gap between yoke 130, or excitation coil 129,respectively, which is disposed to be at least partially surrounded byyoke 130, and yoke 131 in that region where yokes 130, 131 are disposedadjacent to one another. Yoke 130 comprises a cylindrical portion 135,which is separated by insulating resin 133 from a corresponding adjacentcylindrical portion 136 of yoke 131, with the cylindrical portion 135 ofthe yoke 130 of the first pole piece 123 partially surrounding thecylindrical portion 136 of the yoke 131 of the second pole piece 125.The first yoke 130 further comprises an annular disc-shaped portion 137,which is separated by the insulating resin 133 from an adjacentcorresponding annular disc-shaped portion 138 of yoke 131. Thus, thefirst and second yokes 130, 131 are configured and arranged such that aregion between yokes 130 and 131, or more precisely cylindrical andannular disc-shaped portions thereof, provides a considerable surfacearea such that a magnetic resistance between yokes 130 and 131 extendingfrom and forming part of pole pieces 123 and 125, respectively, is lowwhilst both pole pieces 123, 125 are kept electrically insulated fromeach other.

A power supply 141 is connected to first excitation coil 129 forsupplying an excitation current to the first excitation coil 129 forgeneration of a magnetic field in the gap between radial inner ends 124,126 of first and second pole pieces 123, 125. The electric fieldgenerated by the first excitation coil 129 induces a magnetic flux,indicated by arrows 142, in a magnetic circuit formed by magnetic polepieces 123, 125 and yokes 130 and 131 such that the magnetic circuit isclosed via the first gap formed between radial inner ends 124 and 126 ofthe first and second pole pieces 123 and 125, respectively. The magneticfield generated by the first excitation coil 129 has a focusing effecton the electrons of primary electron beamlets exiting from a beam tube152 arranged coaxially with the optical axis 120.

A lower end of the beam tube 152 is disposed in a region of the firstgap between radial inner ends 124, 126 of the first and second polepieces 123, 125. A high voltage supply 153 is provided to maintain thebeam tube 152 at a potential of about +30 kV, in this embodiment. Avoltage supply 155 is connected to the object mount 121 via a connector156 to supply an adjustable high voltage of about −29.7 to −28 kV to theobject mount 121. The object 7 to be inspected is arranged to be inelectrical contact with object mount 121 such that object 7, too, ismaintained at the adjustable potential of about −29.7 to 28.0 kV.

A cathode of an electrode arrangement (upstream, not depicted) ismaintained at a voltage of from about −30 kV to about −45 kV such thatthe primary electrons have a kinetic energy of from about 60 to 90 keVwhen they travel through the beam tube 152. A lower end of beam tube 152is disposed at a distance from the object plane 101 such that theprimary electrons experience a decelerating electric field in a spacebetween the lower end of the beam tube 152 and the object plane 101. Theprimary electrons will then be incident on the object 7 with a landingenergy of from about 50 eV to about 3000 eV.

In addition, a radial inner portion of the first pole piece 123, i.e. aportion comprising a radial inner part of yoke 130 and radial inner end124 of the first pole piece 123, includes a cavity 124″ in which anexcitation coil 127 is disposed. Excitation coil 127 is connected to anon-depicted further power supply in a manner similar to power supply141 and electrically insulated from the first pole piece 123 includingyoke 130. A further gap 124′ is formed within the radial inner end 124of the first pole piece 123 which gap 124′ is joined with cavity 124″.Thus, the first pole piece is functionally divided and configured toform a fourth pole piece and a third gap 124′. When excitation coil 127is excited by the respective power supply, a magnetic field is generatedin a region of the gap 124′, which magnetic field serves to finelyadjust a strength and position of the focusing magnetic field generatedby excitation coil 129 in the first gap between the first pole piece 123and the second pole piece 125.

The electrical field generated between the lower end of beam tube 152and the object 7 is not only defined by their positions and voltagesapplied thereto, but is in the depicted embodiment also influenced by avoltage applied to the second pole piece 125. The radial inner end 126of the second pole piece 125, in particular, may, for instance, bemaintained at a voltage of +3.9 kV relative to the electrical connector156 of object mount 121, by a high voltage source 159 which is coupledto both the electrical connector 156 and the second pole piece 125. Aneffect thereof is described in more detail with reference to FIG. 5below. In addition, in the embodiment depicted in FIG. 2, shieldingelectrode 154 is shown to which the same voltage as to electricalconnector 156 or object mount 121, respectively, is applied so as toshield the object from an electrical field in an area of the shieldingelectrode 154, thus preventing undesired charging of the object. Theshielding electrode has an annular shape with an inner aperture, and issymmetric with respect to the optical axis 120 and further disposed suchthat charged particles may pass through the inner aperture to reach theobject.

As illustrated in FIG. 3, a lower edge of second pole piece 125 isdisposed, at its radial inner end 126, at a distance d₁ from the surfaceof object 7 which surface coincides with object plane 101. The lower endof beam tube 152 is disposed at a distance d₂ from the object plane 101.A diameter of the bore defined by radial inner end 126 of pole piece 125is denoted D₁ and a diameter of the beam tube 152 at its lower end isdenoted D₂.

Distances d₁ and d₂, diameters D₁ and D₂ and the voltages applied topole piece 125 and beam tube 152 relative to the object 7 are adjustedsuch that the electrical field generated immediately above object plane101 in a region close to the optical axis 120 is a substantiallyhomogeneous electrical field. FIG. 3 shows several field lines orequipotential lines representing the electrostatic field between thelower end of beam tube 152 and pole piece 125, and between pole piece125 and the object 7. As illustrated in FIG. 3, a field line 161 closestto the object plane 101 is a substantially straight line indicating asubstantially homogeneous electrical field in a region around opticalaxis 120. Such a substantially homogeneous electrical field is generatedfor the purpose of decelerating each of the primary electron beamlets 3to a desired landing energy. The substantially homogenous electricalfield may also provide a extraction field for the secondary electronsemanating from the object 7 such that each of the secondary electronbeamlets 4′ has a substantially same kinetic energy when entering theobjective lens 102.

In the configuration of the objective lens arrangement as illustrated inFIG. 2, the electrical field at the object plane 101 may be divided intotwo components: A first component E₁ of the electrical field isgenerated by the potential difference between pole piece 125 and object7, and a second component E₂ is generated by the potential differencebetween beam tube 152 and object 7. Both components have a substantiallysame effect on the electrical field at the object plane 101 in a regionaround the optical axis 120. This may be illustrated by changing thevoltages applied to the beam tube 152 and to the pole piece 125according to the following two settings: in a first setting, beam tube152 is set to a potential of 59 kV relative to the object 7, and polepiece 125 is at the same potential as the object 7. The resultingelectrical field at the object plane 101 and on the optical axis 120 is1.8 kV/mm. In a second setting, pole piece 125 is at a potential of 3.9kV relative to the object 7 and the beam tube 152, and the resultingelectrical field at the object plane 101 is 1.2 kV/mm.

The requirement

$\frac{\left( {E_{1} - E_{2}} \right)}{2 \cdot \left( {E_{1} + E_{2}} \right)} = {0.1 < 0.3}$

is thus fulfilled.

In the embodiment illustrated in FIG. 2, a third pole piece 163 extendsalmost parallel to the object plane and has a radial inner end 164. Theradial inner end 164 of the third pole piece 163 is disposed at agreater distance from the optical axis 120 than the radial inner end 126of the second pole piece 125, and both radial inner ends are disposed ina same plane orthogonal to the optical axis 120. A radial gap is thusformed between radial inner end 164 of third pole piece 163 and radialinner end 126 of second pole piece 125. Pole piece 163 is integrallyformed with yoke 131 such that a magnetic circuit is formed by polepiece 125, yoke 131 and pole piece 163, with this magnetic circuit beingclosed via the gap formed between inner ends 126 and 164 of pole pieces125 and 163, respectively. A magnetic flux, indicated by arrows 166, inthis magnetic circuit is generated by an excitation coil 167 to whichcurrent is supplied by a power supply 169. A space formed in the gapbetween pole pieces 125 and 163 is filled with an insulating resin 170which serves to form a layer of insulating material between excitationcoil 167 and pole pieces 125 and 163 and yoke 131. Thus, the excitationcoil 167 is electrically insulated from pole pieces 125 and 163 suchthat it may be operated at ground potential.

In FIG. 2, it is also indicated that the third pole piece 163 has aradial inner annular portion 163IP where a surface of the third polepiece facing the object 7 extends substantially parallel to the object 7disposed in the object plane at a first distance from the object 7. Inaddition, the third pole piece 163 has a radial outer annular portion163OP where the surface of the third pole piece 163 facing the object 7extends substantially parallel to the object plane 101 at a seconddistance from the object 7. The second distance is greater than thefirst distance, that is the outer annular portion 163OP is disposedfurther away from the object 7 than the inner annular portion 163IP.Since the inner and outer annular portions 163IP, 163OP may be disposedat a small angle relative to the object 7, the first and seconddistances may refer to average first and second distances. Inner andouter annular portions 163IP, 163OP are joined by middle portion 163MP,which is disposed at a greater angle relative to the object 7 than boththe inner and outer annular portions 163IP, 163OP of the third polepiece 163. It can also be seen from FIG. 2 that a radial outer end ofthe inner annular portion of the third pole piece is disposed radiallywithin the inner aperture of the shielding electrode.

FIG. 2 further schematically indicates a supply line 171 of coolingwater to provide cooling for excitation coil 167. The line 171 issupplied with cooling water by a cooling water supply 172, which is alsoset to ground potential. Thus, the cooling water supply 172 and thepower supply 169 may be conveniently operated at ground potential as aresult of electrical insulation being provided between excitation coil167 and pole pieces 163 and 125.

The power supply 169 is adjusted to supply an excitation current suchthat the magnetic field generated in the gap between inner ends 126 and164 of pole pieces 125 and 163 compensates the focusing magnetic field,generated in the gap between inner ends 124 and 126 of pole pieces 123and 125, in the object plane 101 and on the optical axis 120. By meansof said compensating magnetic field the focusing field may beadvantageously compensated to zero, which results in the electrons ofthe primary electron beamlets, which are incident on the object 7,experiencing substantially no magnetic field immediately above theobject 7. This absence of magnetic field in said region allows improvingtelecentricity as well as errors resulting from an image rotation, whichwould be induced by the focusing magnetic field.

FIG. 5 shows graphs of magnetic flux density or magnetic field strengthB and electrical field strength E along the optical axis 120. Startingfrom the object plane 101, the magnetic field strength B steeply risesto a maximum at a position 181 on the optical axis 120 of the embodimentdepicted in FIG. 2. Compared to the steep rise of the magnetic field Bstarting at the object plane 101 to the position 181 of the maximum, themagnetic field B then shows only a slow decrease with increasing furtherdistance from object plane 101. Such a moderate decrease of B at anincreasing distance from the object plane 101 may be achieved by atapering shape of a bore formed by radial inner end 124 (the innerportion) of pole piece 123. In a first plane 183 disposed at a distanceof about 28.4 mm from the object plane 101, the bore has a minimumdiameter of about 20 mm. A front surface portion of pole piece 123,which is closest to the object plane 101, is disposed at a distance ofabout 20 mm in a second plane 184, and a diameter of the bore at thisportion is about 41 mm (front diameter). Thus, the diameter of the boreformed by the radial inner end 124 of pole piece 123 radially increaseswith decreasing distance from the object plane 101 from a minimum valueof about 22 mm to a maximum value of about 41 mm (front diameter) inplane 184.

This particular geometry of the radial inner end 124 (or inner portion)of pole piece 123 allows to achieve the relatively moderate decrease offocusing magnetic field strength B with increasing distance from theobject plane 101.

FIG. 5 also indicates a γ-ray, which represents a ray starting off at adistance from the optical axis 120 and parallel to the optical axis 120in the focus plane of the objective lens. This ray γ crosses the opticalaxis 120 at a position close to position 181, which is the location ofthe maximum of the focusing magnetic field strength B. This results in alow value of the field curvature, for instance.

FIG. 5 further illustrates that ray γ intersects the object plane 101 atan angle with respect to the optical axis. This indicates that a lineartelecentric error may be present in the optical system. However, thesmall linear telecentric error is not only tolerated but purposelychosen such that a third order telecentric error is reduced, asillustrated with reference to FIGS. 6a and 6b below.

FIG. 6a illustrates a dependency of the third order telecentric errorwhich objective lens 102 would provide if no first order telecentricerror was present. An average angle of incidence θ and thus the thirdorder telecentric error increases with increasing distance r from thecentral axis or optical axis 120, respectively, according to r³. In FIG.6a , cones 191 indicate focused beams of primary electrons incident onobject plane 101 at locations 192. Directions 193 indicate averagedirections of incidence of the primary electrons of these focused beamsat the respective locations 192. These average directions 193 areoriented under average angles of incidence θ with respect to the opticalaxis. A maximum average angle θ at a maximum distance of a primaryelectron beam 191 from the optical axis 120 may be as much as 40 mrad.

The field lens 305 shown in FIG. 1, for instance, may be designed suchthat it introduces a linear telecentric error such that the beam pathentering objective lens arrangement 100 is not a telecentric beam path.This results in a dependency of the third order telecentric error asshown in FIG. 6b : starting from r=0, the average angle of incidence θwill first pass through a minimum of −10 mrad and then reach a maximumof +10 mrad at the maximum value of r. Thus, compared to the situationshown in FIG. 6a , a maximum value of the third order telecentric errorhas been successfully reduced.

FIG. 6b may be also interpreted as follows: in an inner ring portion 195where the negative maximum θ(r) is located, the electron beams incidenton the object plane 101 are diverging from the optical axis (negativeaverage angle of incidence, negative maximum θ_(i)), and in an outerring portion 196 surrounding inner ring portion 195, the primaryelectron beams incident on the object plane 101 are converging withrespect to the optical axis (positive angle of incidence, maximumaverage angle of incidence θ₀. This scenario may be suitably expressedby the ratio

$0.5 < \frac{\theta_{i}}{\theta_{0}} < 2.$

Line C_(S) in FIG. 5 further indicates the dependency of the fieldcurvature, and line E′ a dependency of the derivative of the electricalfield strength E along the optical axis 120.

It appears that, when starting off at a great distance from the objectplane 101, the field curvature C_(S) gradually increases except for aregion, where E′ is negative and where the focusing magnetic field Bincreases. This reduction of the field curvature C_(S) in the region ofnegative E′ and increasing B is advantageous for reducing the value ofC_(S) at the object plane 101.

In FIG. 4, an exemplary embodiment of a shape of beam tube 152 andinsulation 132 between the beam tube 152 and the first pole piece 123 isdepicted. Beam tube 152 is, for the largest part, a straight pipe havinga substantially constant wall thickness down to a lower end. Lower endof beam tube 152 is constituted by a part of beam tube 152, which isturned by about 180° in a direction of a radial outer side of beam tube152. The lower end is formed into a rounded rim, leaving a gap 152″between a radially outer side of the straight section of beam tube 152and rounded rim 152′. Gap 152″ has a substantially rectangular shape andextends parallel to the wall of the straight part of beam tube 152. Awidth t₄, i.e. a dimension in radial direction, of gap 152″ is about 2mm. A cross-section of rim 152′ may be suitably described by means ofradii of circles fitted to an outer surface of rim 152′, i.e. a surfacefacing away from the straight part of beam tube 152. On an uppermostpart 152′a of rim 152′, i.e. a part farthest away from the object plane101, the surface profile of rim 152′ may be described by a radius ofcircle C1, which radius is about 1.2 mm, an adjacent part 152′bdescribed by a radius of circle C4, which is about 11 mm, furtheradjacent part 152′c by a radius of circle C3, which radius is about 3mm, a radially outer lower end 152′d of rim 152′ by a radius of circleC5, which radius is about 6 mm, and a radially inner lower end 152′e ofrim 152′ by a radius of circle C2, which radius is about 1.2 mm. Theuppermost part 152′a of rim 152′ is spaced a distance t₂ of about 5 mmapart from a radial inner end 124 of the first pole piece 123. Theradially lower end 152′d of rim 152′ is spaced a distance t₃ of about 10mm apart from electrode 144 disposed on the second pole piece 125.

This shape of the beam tube 152, in particular the design of rim 152′enables the realization of an advantageous shape of electrical field. Inparticular, a slanted and/or tapered area of inner end 124 of first polepiece 123 is efficiently separated from the optical axis 120.

An insulating member 132 is disposed in a spacing formed in between apart of radial inner end 124 that extends in parallel to an outer sideof beam tube 152 and the outer side of beam tube 152 and has a thicknessor width t₁ of about 4 mm in that area. In an area where a diameter ofradial inner end 124 of the first pole piece 123 starts to increase(beginning of slanted or tapered portion of the first pole piece 123,see also plane 183 in FIG. 2), insulating member 132 is split into twoportions 132′ and 132″, with portion 132′ extending further along aradial outer side of beam tube 152 until a lower end of gap 152″ andportion 132″ extending a short way along the slanted portion of thefirst pole piece 123. This shape and arrangement of insulating member132 allows efficient electrical insulation of the first pole piece 123as well as rim 152′ from the pipe-shaped portion of beam tube. Theregion inside gap 152″ is void of any electrical fields thus beingadvantageous for avoiding occurrences of creeping currents and surfaceleakages. A portion of the slanted (or tapered) portion of the firstpole piece 123 is covered by electrode material 140.

FIG. 7 illustrates a further embodiment of the objective lensarrangement according to the present invention. The numbering ofcomponents of the objective lens arrangement of FIG. 2 is adhered to. Ashape of the first pole piece 123 is different from the embodimentdepicted in FIG. 2 in that is does not provide a cavity and thus nofourth pole piece, and thus no additional adjusting magnetic field isprovided. Instead, alignment elements (not depicted) are disposed in aspace 149 between upper radial inner end 124′″ of the first pole piece123 and insulation 132 of beam tube 152. Insulation 132 of beam tube 152comprises several subsections 132′, 132″ that have been described indetail with reference to FIG. 4. Other than the lack of cavity 124″, anarrangement of the first, second and third pole pieces as well as anarrangement of excitation coils and power supplies is quite similar tothe one of the embodiment depicted in FIG. 2. A surface of the secondmagnetic pole piece 125 facing away from the object plane 101 is, in aradially inner area, covered by electrode material 144, which isconnected to electrode material 144′ disposed on a radially innerportion of a surface of the third pole piece 163 facing towards theobject plane 101. An insulation between first pole piece 123 and secondpole piece 125 is provided by insulating resin 133, which insulatingresin 133 extends radially inwards up to a radially outer edge ofelectrode material 144. A space in which excitation coil 129 is disposedinside the first pole piece 123 is separated from an inside of theobjective lens arrangement via insulating member 143, one end of whichis attached to the first pole piece 123 by a screw 145, wherein a gasket146 is provided in a gap adjacent to the screw in between the one end ofthe insulating member 143 and first pole piece 123. An additional gasket146′ is provided at the other end of insulating member 143, which end ofthe insulating member 143 is interposed between insulating resin 133 andthe annular disc-shaped portion of the first pole piece 123.Water-cooling system 173 is disposed immediately adjacent to a side ofexcitation coil 129, which faces away from the object plane 101, whichwater cooling system 173 is attached via an electrically insulated screw175 to yoke 130 of the first pole piece 123. Water-cooling system 173 isconnected to a cooling water supply 174 disposed outside of objectivelens arrangement 102. The water-cooling system is thus providedconveniently in an environment of about atmospheric pressure.

Excitation coil 167 as well as a line of cooling water are embedded incast resin 170 in a spacing formed inside second and third pole pieces125, 163 and yoke 131 to provide electrical insulation from the secondand third pole pieces 125, 163 as well as allowing cooling water supply172 to be provided in an environment of about atmospheric pressure. Agasket 147 is provided adjacent to a radial inner end of cast resin 170,which is also pressed against a surface of the second pole piece 125facing towards the object plane 101 and a surface of the third polepiece 163 facing away from the object plane 101, thus providing apressure seal.

Apart from allowing to have water-cooling arrangements 173, 174, 171,172 in an environment of about atmospheric pressure, the above-describedinsulating arrangements are advantageous in that they dispose of theneed to evacuate large spacings inside the objective lens arrangement.

A ceramic/cast resin member 134 is provided between shielding electrode154 and a surface of the third pole piece 163 facing towards the objectplane 101 in order to provide both electrical insulation between thethird pole piece 163 and the shielding electrode 154 as well as toprovide a pressure seal. A radially inner end of cast resin/ceramicmember 134 has a portion of decreased thickness to accommodate a gasket148 in between the thin portion of resin/ceramic member 134 and theobject-facing surface of the third pole piece 163. Cast resin/ceramicmember 134 and shielding electrode 154 are attached to connecting ring180′, which connects the shielding electrode to a further ring 180,disposed in alignment with shielding electrode 154. The further ring 180has a ring 139 of ceramic/resin material disposed thereon, which, inturn, is connected to cast resin/ceramic member 134 and yoke 130 viascrew 179, connecting member 178, and connecting member 177, which isattached to yoke 130 via screw 176.

In FIG. 8, a further embodiment of the objective lens arrangementaccording to the present invention is illustrated. The principal layoutof the main components, such as pole pieces and beam tube, correspondslargely to that of the previously described embodiments. A maindifference between the embodiments of FIGS. 2 and 7 on the one hand andFIG. 8 on the other hand is given by the arrangement of the first polepiece relative to the beam tube. Whilst in the previous two embodiments,the first pole piece 123 was electrically insulated from the beam tube152 and at ground potential, in the embodiment depicted in FIG. 8, aninner portion of the first pole piece 1501 is electrically connected tobeam tube 1152. In particular, the beam tube 1152 is attached to aradial innermost portion of the first pole piece 1501. Thisconfiguration has an advantage in that provision of voltage to the beamtube 1152 is facilitated as compared to the previously describedembodiments. The first pole piece is hence, in this embodiment, set tothe same potential as the beam tube. This has no detrimental effect onan electrostatic field or magnetic field in the region of the beam tube1152. The first pole piece being set to a voltage necessitates thedivision of the first pole piece into an inner portion 1501 which isconnected to the beam tube 1152 and electrically insulated from a secondportion 1502 of the first pole piece by an insulating layer 1503. Inorder to allow magnetic flux to pass from the inner portion 1501 of thefirst pole piece to the outer portion 1502 of the first pole piece, theinner portion 1501 comprises a cylindrical portion 1501A which isarranged to face and be arranged in parallel to a cylindrical portion1502A of the outer portion 1502 of the first pole piece. Additionally,the inner portion 1501 of the first pole piece comprises a flat, annularsection 1501B joined in a radially outwards direction to the cylindricalportion 1501A and being arranged parallel and opposite to an annularsection 1502B of the outer portion of the second pole piece, such as toenable a closed magnetic circuit. Insulating layer 1503 extends along asection of tapering inner portion of the first pole piece 1501, andfills a gap formed between cylindrical portions 1501A, 1502B as well asannular portions 1501B, 1502B.

In FIG. 8, it is also indicated that the inner portion 1501 of the firstpole piece also comprises a conus-shaped section having a conus openingangle a with respect to the optical axis 1120.

In addition, water-cooling lines 1173 disposed around excitation coil1129 are also illustrated in FIG. 8.

A further difference to the previously described embodiments lies in themounting of the second and third pole pieces, the cooling of theexcitation coil arranged in between the second and third pole pieces,and the sealing of spaces inside the various components.

Excitation coil 1167 is encased on three sides in ceramic insultingmaterial 1510, with both the excitation coil 1167 as well as the ceramicinsulating material 1510 being fixed in the space between the second andthird pole pieces by cast resin 1511. The ceramic insulating material1510 is connected to an outer ring of thermally conductive material,which in turn, is connected to the first pole piece via copper wiring.This arrangement is not depicted in FIG. 8, for simplicity's sake, butdescribed in detail with reference to FIG. 10. FIG. 8 shows a part ofthe mounting structure for holding the second and third pole pieces1163, 1125. The mounting structure comprises a holding bracket 1512disposed on a radially outer side of the second and third pole pieces1163, 1125, which bracket 1512 spans an upper side of the second polepiece 1125 and a lower side of the third pole piece 1163. In between thebracket 1512 and the pole pieces 1163, 1125, a further insulating layer1513 is provided, which extends further along the pole pieces 1163,1125. The bracket 1512 is fixed to a mounting ring 1514. Mounting ring1514 is held in position by three metal wires 1515 which are fixed to alower portion of the first pole piece via connecting member 1516. Thismounting structure allows adjusting a position of the pole pieces 1125,1163 with respect to the first pole piece and the object plane. Inaddition, this mounting structure enables the second and third polepieces 1125, 1163 to be disposed entirely in a vacuum environment thuseliminating the need to evacuate a space inside the two pole pieces1125, 1163 and eliminating a plurality of seals thus increasing an easeof operation and installation.

In a further aspect, the shape chosen for the inner portion 1501 of thefirst pole piece allows to integrate a component disposed upstream ofthe objective lens arrangement within a space or bore formed by theinner portion 1501, thus decreasing an overall space requirement of aninspection system and improving optical properties of the system. In theembodiment depicted in FIG. 8, a lower part of a beam path splittingarrangement 1400 is depicted, with an outside thereof being shown in aschematic and simplified manner as outline 1400′. In addition, a lowerportion of a magnetic field arrangement 1407 is shown. A step-shapedprotrusion 1501C is formed on an inside of the inner portion of thefirst pole piece 1501, which inside faces away from the object plane. Aholding element 1575 having an upper side with an insulating layer 1576attached thereto is held by and fixed to protrusion 1501C of the innerportion 1501 of the first pole piece. The outside 1400′ of the beam pathsplitting arrangement may be advantageously formed such that its outlinecorresponds to that formed by the holding elements 1575 and theinsulating layer 1576 thereon. The lower portion of the beam pathsplitting arrangement 1400 may then be arranged such that it remainsspaced apart from the holding element 1575 or alternatively such that itrests on holding element 1575 (or insulating layer 1576, respectively).Thus, the lower portion of beam path splitting arrangement 1400 isinserted into a space formed by the cylindrical portion 1501A andannular portion 1501B of the first pole piece. Thus, a lower end of thebeam path splitting arrangement, and in particular a lower end P1 of themagnetic field arrangement 1407, is disposed at a first distance D₁ fromthe object plane 1101 which first distance D₁ is smaller than a seconddistance D₂ between an upper side P2 of the excitation coil 1129 and theobject plane 1101. A conical shaped inner lower portion and acylindrical upper portion of the inner portion of the first pole piecethus accommodate a portion of the beam splitting arrangement.

In FIG. 9, a schematic illustration of an exemplary beam path splittingarrangement 400 and a simplified embodiment of objective lensarrangement 100 is given. Primary electron beam path 3′ comprising aplurality of primary electron beamlets enters a first magnetic fieldportion 403 of beam path splitting arrangement 400. Field portion 403provides a homogeneous magnetic field deflecting the primary electronbeam path by an angle a to one side, in particular to the left in adirection of travel of the electrons, as viewed in FIG. 9. The primaryelectron beam path 3′ subsequently passes a drift region 405 which issubstantially free of magnetic fields such that the primary electronbeam path 3′ follows a straight line in drift region 405. Then theprimary electron beam path 3′ enters a field region 407 in which ahomogeneous magnetic field is provided for deflecting the primaryelectron beam path 13 at an angle β to the right. Subsequently, primaryelectron beam path 3′ enters the objective lens arrangement 100 whichserves to focus the primary electron beamlets onto the surface of object7 positioned in object plane 101. The axis 120 of the objective lensarrangement 100 coincides with optical axis z of the entire system.

The objective lens arrangement 100 comprises a magnetic lens grouphaving a magnetic focusing function and an electrostatic lens grouphaving an electrostatic focusing function on the primary electronbeamlets. Possible configurations of this electrostatic lens groupaccording to the present invention have been described before, withreference to FIGS. 2 and 8, for instance. Further, the electrostaticlens may be configured to exert a decelerating effect on the primaryelectrons by an electrical field for decelerating the primary electronsbefore impinging on object surface 7. The electrostatic lens arrangementreferred to in the context of the description of this Figure may bechosen from any suitable embodiments as described above.

A controller 420 is provided for changing the voltage supplied to theelectrostatic lens arrangement such that the kinetic energy with whichthe primary electrons impinge onto the object, the landing energy, maybe adjusted, for instance in a range of about 0.3 keV to 2.0 keV. Thekinetic energy with which the primary electrons pass the beam pathsplitting arrangement 400 is generally constant and independent of thelanding energy of the primary electrons on the object surface.

Further details of the depicted beam path splitting arrangement may befound in WO 2005/024881 A2 (U.S. provisional application Ser. No.60/500,256) to the same Assignee. A person skilled in the art will befamiliar with the technology for designing and constructing the beamsplitter comprising plural magnetic field regions as illustrated above.Reference may be made to U.S. Pat. No. 6,040,576 or “SMART: A PlannedUltrahigh-Resolution Spectromicroscope For BESSY II” by R. Fink et al,Journal of Electron Spectroscopy and Related Phenomena 84, 1987, pages231 to 250 or “A Beam Separator With Small Aberrations” by H. Müller etal, Journal of Electron Microscopy 48(3), 1999, pages 191 to 204.

The absolute values of the field strengths in field portions 403 and 407are about equal, and lengths of field portions 403 and 407 are chosensuch that a spatial dispersion induced by the deflection by the angle αto the left and the subsequent deflection by the angle β to the right issubstantially zero. Further, the field portions 403 and 407 and thedrift region 405 are chosen such that the deflections induced by thebeam path splitting arrangement 400 on the primary electron beam path 3′are in first order substantially stigmatic and in first ordersubstantially distortion free. Thus, a pattern may be imaged in highquality onto the surface of object 7. This imaging quality is maintainedsubstantially independent of the landing energy of the primary electronsonto the object 7.

The secondary electron beam path 4′ comprising a plurality of secondaryelectron beamlets is separated from the primary electron beam path 3′ byfield region 407 which deflects the secondary electron beam path 4′ byan angle γ to the right.

The secondary electrons emanating from the object 7 with a kineticenergy range of about 0 eV to 100 eV, for instance, will be acceleratedby the electrical field generated by electrostatic lens arrangement ofthe objective lens arrangement 100 to a kinetic energy which isdependent on a setting provided by controller 420 for adjusting thelanding energy of the primary electrons. Thus, the kinetic energy of thesecondary electrons entering field region 407 will change in dependenceof the landing energy of the primary electrons.

Deflection angle γ for the secondary electron beam path 4′ provided byfield region 407 will change, accordingly. After leaving field region407, the secondary electron beam path passes a drift region 409 which issubstantially free of magnetic fields before entering a further magneticfield region 411 providing a homogeneous magnetic field deflecting thesecondary electron beam path 4′ further to the right. Field strength offield region 411 may be adjusted by a controller 413. After leaving thefield region 411, the secondary electron beam path immediately enters afurther field region 415 providing a homogeneous magnetic field, a fieldstrength of which may be also adjusted by controller 413. Controller 413operates in dependence of a setting of the landing energy of primaryelectron beams and adjusts the magnetic field strength in field regions411 and 415 such that the primary electron beam path leaves field region415 at a pre-defined position and in a pre-defined direction which areindependent of the landing energy of the primary electrons and thedeflection angle γ, respectively. Thus, the two field regions 411, 415perform a function of two subsequent beam deflectors which allows toadjust the secondary electron beam to coincide with the pre-definedsecondary electron beam path 4′ when the same leaves magnetic fieldregion 415.

The changes in the magnetic field strengths of field regions 411, 415caused by controller 413 result in changes of a quadrupole effect, whichthese electron optical elements 411, 415 have on the secondaryelectrons. In order to compensate for such changes of the quadrupoleeffect a further magnetic field region 419 is provided immediatelydownstream of field region 415. In magnetic field region 419 ahomogeneous magnetic field is provided, a field strength of which iscontrolled by controller 413. Further, downstream of magnetic fieldregion 419 a quadrupole lens 421 is provided which is controlled bycontroller 413 to compensate, in cooperation with magnetic field region419, the remaining quadrupole effect induced by field portions 411, 415when compensating the beam path for different landing energies of theprimary electrons.

The electron-optical components 407, 409, 411, 415, 419 and 421 providedin the secondary electron beam path are configured such that, for oneparticular setting of the landing energy of the primary electrons, thesecondary electron beam path through the beam path splitting arrangement400 is in first order substantially stigmatic, in first order distortionfree, and in first order dispersion corrected. For other settings of thelanding energy than 2 kV this imaging quality may be maintained, areduction of the dispersion correction to a limited amount occurs,however.

It is to be noted that an intermediate image of object plane 101 isformed in a region of field portions 407, 411, 415 and 419. A positionof the intermediate image will change along the beam axis in dependenceof the setting of the landing energy of the primary electrons and thekinetic energy of the secondary electrons, accordingly.

In FIG. 10, an embodiment of a cooling arrangement based entirely oncooling by means of solid materials suitable for use in particular withthe embodiment shown in FIG. 8 is schematically illustrated. Likenumerals refer to like components. Excitation coil 1167 is, in thisexemplary embodiment, surrounded on practically all sides by a ceramic,electrically insulating layer 1510. Both the excitation coil 1167 andthe insulating layer 1510 extend substantially continuously in a fullcircle around the optical axis (with the exception of electricalconnections of the excitation coil penetrating through the ceramicinsulation which are connected to an external power supply, not shown).A further layer 1511 of electrically insulating material, in thisinstance cast resin, is provided on three sides of the arrangement ofthe excitation coil 1167 and ceramic insulation 1510. The ceramicinsulation 1510 is connected via connecting members 1510A to an outerring comprising both a ring of ceramic material 1512 and a ringcomprising an outer ceramic sheath 1510B encasing an inner core 1510Cmade of copper. Both rings are fixed to mounting ring 1514, which isfixedly attached to the second and third pole pieces 1125, 1163 and hasbeen described with reference to FIG. 8. The ceramic connecting member1510A provides a thermally conductive contact between the ceramicinsulation 1510 around the excitation coil 1167 and the copper core ring1510C and the ceramic ring 1512 for removing heat generated by theexcitation coil 1167. In contrast to the core ring 1510C made of copperand the ceramic insulation 1510 surrounding the excitation coil 1167,the connecting member 1510A is not formed as a continuous ring, but isformed of small ring sections disposed around a circumference of theyoke integrally formed with and connecting the second and third polepieces 1125, 1163, which small sections penetrate through a radial outerside of the second and third pole pieces 1125, 1163 of said yoke. Thecopper and ceramic rings, 1510 A through C are connected via a(non-depicted) copper wire to a cooling system outside the evacuatedinside of the objective lens arrangement. The connection may beconfigured, for instance, in analogy to wire 1515 and connecting piece1516 shown in FIG. 8 in connection with the mounting structure andfurther extend through the first pole piece to connect to a coolingsystem of the excitation coil accommodated within the first pole piece.Thus, a cooling system is provided which facilitates electricalinsulation of the cooling system from the excitation coil and alsoallows for a flexible mounting structure for the second and third polepieces.

In FIG. 11, an adjusting arrangement for adjusting a radial position ofthe second and third pole pieces, which are held by mounting ring 1514,as shown in FIG. 8, is illustrated in a schematic and simplified manner.An adjustment screw 1594 is accommodated in a bore 1594′ of the mountingring 1514. The lower end of the bore 1594′ and thus the lower end of thescrew 1594 are operably linked to a top of a chamber 1595 which containstwo balls 1597 on top of one another, i.e. an upper and a lower ball,and a wedge-shaped member 1596, with a pointed edge 1596′ of thewedge-shaped member 1596 being disposed in between the two balls 1597.This arrangement may further comprise a counter-bearing, which is onlyindicated in terms of its effect as arrows 1598 in FIG. 11. The top ofchamber 1595 and the screw 1594 are further connected such that turningof the screw 1594 does not only drive the screw 1594 further into themounting ring 1514 and into the chamber 1595 but also lifts up themounting ring 1514 together with the bottom of the chamber such that,upon turning of the screw 1594, not only the upper ball is pusheddownwards, but also the lower ball pushed upwards. When the two ballsare pushed further together, they both exert a force onto thewedge-shaped member 1596 such that the wedge-shaped member 1596 is movedin a radial direction. Since the wedge-shaped member is operablyconnected to the second and third pole pieces, this radial movement istranslated into radial movement of the second and third pole pieces. Thesame principle applies to turning the screw 1594 in the other direction,with the balls 1597 moving further apart and the wedge-shaped member1596 moving further into the chamber, again effecting radial movement ofthe pole pieces.

The embodiment schematically shown in FIG. 12 largely corresponds tothat shown in FIG. 8, the difference being that the embodiment shown inFIG. 12 comprises a heating system. The depicted heating systemcomprises a heating coil 1199 which is provided inside the secondexcitation coil 1167. The heating coil 1199 comprises several windingsof a wire, which is made from the same material as the wire of thesecond excitation coil 1167 and is disposed adjacent to the wire formingthe secondary excitation coil 1167. The heating coil 1199 is connectedto a power supply PS and controlled by a control unit C1 which adjusts acurrent supplied by the power supply PS to the heating coil 1199 independence of a temperature of the second and third pole pieces 1163,1125 and an excitation current supplied to the second excitation coil1167. The temperature of the second and third pole pieces 1163, 1125 ismeasured by temperature sensors T1 and T2, which supply the data of themeasured temperatures to a control unit C2. The excitation currentsupplied to the second excitation coil 1167 is controlled by controlunit C3. Control units C2 and C3 supply the data of the temperatures ofthe second and third pole pieces 1163, 1125 and of the excitationcurrent supplied to the second excitation coil 1167 to control unit C1of the heating system, which calculates an excitation current to beprovided to the heating coil 1199 on the basis of the supplied data.Control units C1, C2, C3 may also be portions of a single control unit.Thus, the pole pieces and an environment on the inside of the objectivelens arrangement may be kept at a constant temperature and maintain aconstant environment.

In FIG. 13, a detail of the embodiment shown in FIG. 8 is shown toillustrate angles formed between inside surfaces of the second and thirdpole pieces 1163, 1125. The second pole piece 1125 has a surface 1125Sfacing the third pole piece 1163 and the third pole piece 1163 has asurface 11635 facing the second pole piece 1125. In a first annularportion about the optical axis 1120 denoted IPR1 in FIG. 13, thesurfaces 11255, 11635 of the second and third pole pieces 1125, 1163form an angle β₁ between them which is about 9°. In a second annularportion about the optical axis 1120 denoted IPR2 in FIG. 13, thesurfaces 1125S, 1163S of the second and third pole pieces 1125, 1163form an angle β₂ between them which is about 10°. In a third annularportion about the optical axis 1120 denoted IPR3 in FIG. 13, thesurfaces 1125S, 1163S of the second and third pole pieces 1125, 1163form an angle β₃ between them which is about 15°. Thus, in connectionwith the small angles of the second and third pole pieces 1125, 1163with respect to object 7, a relatively wide and flat arrangement of thepole pieces and thus the entire objective lens arrangement is realized.

While the invention has been described also with respect to certainspecific embodiments thereof, it is evident that many alternatives,modifications and variations will be apparent to those skilled in theart. Accordingly, the exemplary embodiments of the invention set forthherein are intended to be illustrative and not limiting in any way.Various changes may be made without departing from the spirit and scopeof the present invention as defined in the following claims.

1-51 (canceled)
 52. An electron microscopy system for inspection of anobject, comprising: a beamlet-generating arrangement comprising at leastone electron source and a multi-aperture plate and configured togenerate a plurality of primary electron beamlets, wherein a number ofthe primary electron beamlets is greater 25; a primary electron beampath configured to direct the plurality of primary electron beamletsonto an object arranged in an object plane of the electron microscopysystem; a secondary electron beam path configured to supply a pluralityof secondary electron beamlets from the object plane to a detector, thesecondary electron beam lets emanating from a surface of the objectarranged in an object plane; an objective lens arrangement configured tofocus the primary electron beamlets in the object plane, wherein theobjective lens is traversed by the primary electron beam path and thesecondary electron beam path, wherein the objective lens arrangementcomprises a first magnetic pole piece having an inner portion defining abore; and a beam path splitting arrangement provided in the primaryelectron beam path between the beamlet generating arrangement and theobjective lens arrangement and in the secondary electron beam pathbetween the objective lens arrangement and the detector; wherein a lowerportion of the beam path splitting arrangement is integrated within thebore defined by the inner portion of the first magnetic pole piece ofthe objective lens.
 53. The electron microscopy system according claim52, wherein the objective lens arrangement further comprises a secondmagnetic pole piece, a first excitation coil and a power supplyconnected to the first excitation coil for generating a focusingmagnetic field having a focusing effect on the primary electronbeamlets.
 54. The electron microscopy system according to claim 52,wherein the objective lens arrangement further comprises anelectrostatic lens arrangement.
 55. The electron microscopy systemaccording to claim 54, further comprising: an object mount for mountingthe object such that a surface of the object is disposed in the objectplane; and a voltage supply connected to the object mount and configuredto supply a voltage to the object mount such that the primary electronsexperience a decelerating field and such that a landing energy ofprimary electrons incident on the object is below 3000 eV.
 56. Theelectron microscopy system according to claim 55, further comprising acontroller connected to the electrostatic lens arrangement, wherein thecontroller is configured to adjust the landing energy of primaryelectrons in a range from about 0.3 keV to about 2.0 keV.
 57. Theelectron microscopy system according to claim 52, wherein the objectivelens arrangement further comprises a third pole piece, wherein the thirdpole piece has a surface portion facing the object, and wherein thesurface portion facing the object is substantially parallel to theobject plane.)
 58. The electron microscopy system according to claim 57,wherein the objective lens arrangement further comprises a secondexcitation coil and a power supply connected to the second excitationcoil; wherein the power supply is configured to supply an excitationcurrent to the second excitation coil for generating a magnetic fieldcancelling the focusing magnetic field generated by the first excitationcoil in the object plane, such that the electrons of the primaryelectron beamlets experience substantially no magnetic field immediatelyabove the object plane.
 59. The electron microscopy system according toclaim 52, further comprising a shielding electrode electricallyinsulated from the third pole piece and disposed between the third polepiece and the object mount.
 60. The electron microscopy system accordingto claim 52, further comprising a holding element and an insulatinglayer attached to an upper side of the holding element, wherein thelower portion of the beam path splitting arrangement rests on theinsulating layer of the holding element.
 61. The electron microscopysystem according to claim 52, further comprising a field lens designedsuch that an angle of incidence of each primary electron beamletincident on the object plane deviates from a direction of an opticalaxis of the objective lens by not more than between −10 mrad and +10mrad.
 62. The electron microscopy system according to claim 52, furthercomprising: at least one of a cooling arrangement and a heating system;a temperature sensor; and a control unit configured control the at leastone of the cooling arrangement and the heating system based on an outputof the temperature sensor to keep the pole pieces at a constanttemperature.
 63. The electron microscopy system according to claim 52,wherein the secondary electron beam path is configured to generate anintermediate image of the object plane.